Year | 2018 |
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Authors | Hsin-Lung Chen ,Chen, M.-H.; Lai, C.-C.; Chen, H.-L*.; Lin, Y.-H.; Huang, K.-Y.; Lin, C.-H.; Hsiao, H.-T.; Liu, L.-C.; Chen, C.-M. |
Paper Title | Preparation of photosensitive polyimides (PSPIs) and their feasible evaluation for lithographic insulation patterns (LIPs) of integrated circuits (ICs) without negative photoresists. |
Journal Title | Materials Science in Semiconductor Processing |
Vol.No | 88 |
Page(s) | 132- |
Language | English |